China has established an EUV light source experimental platform, and the realization of this achievement needs to be further observed to determine whether it has achieved the problem of breaking through the independent production of advanced chips mentioned in the South China Morning Post. At the same time, the impact of this achievement on Asmay’s viewpoint is also a question worthy of attention.
Research results release
The research paper published in the sixth issue released by the journal China Laser in the second half of March 2025 pointed out that my country’s scientific research team has successfully developed a set of experimental platforms for EUV light sources with operating parameters comparable to international standards. This achievement has had a profound impact on the progress of my country’s independently developed EUV lithography technology and its related core devices and technologies. A report by Hong Kong’s South China Morning Post on April 29 pointed out that this achievement has a significant helping effect on the difficulties my country faces in the process of independently producing high-end chips.
Technical route comparison
Asmay uses carbon dioxide laser driving technology and highlights the multi-dimensional advantages of this technology. At the same time, Lin Nan’s team’s research found that after nearly ten years of continuous development, its advantages have been significantly enhanced. In the field of EUV lithography technology and key device research and development in my country, this technology may be playing an important role and has expanded new paths for my country’s chip research and development field.
Experimental platform results
my country’s scientific research team has achieved a breakthrough in high conversion efficiency on the LPP-EUV light source experimental platform. This achievement is not only at the forefront of the world, but also in a leading position in China. Lin Nan’s team predicts that the theoretical maximum conversion efficiency of the experimental platform is expected to reach about 6%. This progress fully demonstrates my country’s strong R&D capabilities in the field of core chip technology.
CEO of Asmay comments
The South China Morning Post reported that earlier this month, shortly after the results were released, Christoph Fukai, a senior manager of Asmay, still reiterated that although China has the potential to develop EUV light sources, the road to producing EUV lithography machines is still very far away. This view shows that Asmay has certain prejudice against the development of China’s chip technology.
Breakthrough of core components
Lin Nan’s team successfully developed an LPP-EUV light source, which is one of the key components of the lithography machine, and its importance is self-evident. In EUV lithography machine systems, laser plasma (LPP) EUV light sources play a core role. This technological achievement is expected to become a key turning point in the development of China’s semiconductor industry.
Light source efficiency index
In the research and development stage of EUV light sources, improving energy conversion rate faces challenges. Lin Nan’s team’s research found that by using 1μm solid laser to excite Sn plasma, the energy conversion efficiency CE is expected to meet the standards for engineering applications. The peak of this efficiency can reach 3.42%, ranking at the forefront of the world and even lead in the country. This achievement has played a positive role in promoting the development of my country’s chip technology.
my country has recently achieved significant breakthroughs in the construction of EUV light source experimental platform. Even though the senior management of Asmay, the Netherlands, is cautious about domestic lithography machine technology, the development trend of my country’s scientific research team is still strong. Regarding when my country can shake the monopoly of ASMA in the EUV lithography machine market, we are eagerly looking forward to reading your views in the comment area, and we sincerely invite you to like and forward this article!
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